首页> 外文会议>Electronic Components amp; Technology Conference, 2000. 2000 Proceedings. 50th >Fabrication of silicon-on-reflector for Si-basedresonant-cavity-enhanced photodetectors
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Fabrication of silicon-on-reflector for Si-basedresonant-cavity-enhanced photodetectors

机译:硅基反射硅的制作共振腔增强光电探测器

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A novel silicon-on-reflector substrate for Si-basedresonant-cavity-enhanced photodetectors has been fabricated by usingSi-based sol-gel and smart-cut techniques. The Si/SiO2 Braggreflector is controlled in situ by electron beam evaporation and thethickness can be adjusted to get high reflectivity. The reflectancespectra of the silicon-on-reflector substrate with five pairs of Si/SiO2 reflector have been measured and simulated by transfermatrix model. The reflectivity at operating wavelength is close to 100%.Based on the silicon-on-reflector substrate, SiGe/Si multiple quantumwells resonant-cavity-enhanced photodetectors for 1.3 μm wavelengthhave been designed and simulated. Ten-fold enhancement of the quantumefficiency of resonant-cavity-enhanced photodetectors compared withconventional photodetectors is predicted
机译:用于Si基的新型反射硅衬底 谐振腔增强光电探测器已通过使用 硅基溶胶凝胶和智能切割技术。 Si / SiO 2 布拉格 反射镜通过电子束蒸发原位控制,并且 可以调节厚度以获得高反射率。反射率 五对Si / SiO的反射硅衬底的光谱 2 反射器已通过传输进行了测量和模拟 矩阵模型。工作波长下的反射率接近100%。 基于反射硅衬底,SiGe / Si多量子 阱谐振腔增强型光电探测器,波长为1.3μm 已经设计和模拟。量子增强十倍 谐振腔增强光电探测器的效率与 可以预测传统的光电探测器

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