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Fast Neutron Irradiation Effects on Multiple Gallium Nitride (GaN) Device Reliability in Presence of Ambient Variations

机译:存在环境变化时快速中子辐照对多种氮化镓(GaN)器件可靠性的影响

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Radiation-hard semiconductor devices are becoming more important for a growing number of nuclear and space applications. Gallium Nitride (GaN) semiconductor devices can be highly beneficial in this regard. In this paper, we report the electrical performance of multiple AlGaN/GaN deep UV LEDs irradiated by high fluence fast neutrons. The irradiation experiment was conducted in a newly enhanced beamline at the Los Alamos Neutron Science Center (LANSCE) from 2014-2016 with a maximum fluence of 2.41x1013 neutrons/cm2 over a 3-year span, in an temperature varying, semi-open outdoor housing. We continuously monitored the I-V characteristics of all GaN devices, and showed that they maintained proper I-V behaviors as the neutron fluence increased. Extensive data analysis further shows that effects of neutron irradiation fluence increment in a given day are actually smaller than that induced by daily temperature variation. Our experimental results facilitate the design of diagnostics systems such as multi-pixel imagers for high energy density physics experiments, and complex space electronics that must survive through both high fluence radiation and large orbital temperature variations.
机译:对于越来越多的核和太空应用,抗辐射半导体器件变得越来越重要。在这方面,氮化镓(GaN)半导体器件可能会非常有益。在本文中,我们报告了由高通量快中子辐照的多个AlGaN / GaN深紫外LED的电性能。 2014-2016年在洛斯阿拉莫斯中子科学中心(LANSCE)的新增强束线中进行了辐照实验,最大通量为2.41x10 13 中子/ cm 2 在三年内,安装在温度变化的半开放式室外房屋中。我们连续监测所有GaN器件的I-V特性,并显示它们随着中子注量的增加而保持适当的I-V行为。广泛的数据分析进一步表明,在给定的一天中,中子辐照通量增加的影响实际上要小于每日温度变化所引起的影响。我们的实验结果促进了诊断系统的设计,例如用于高能量密度物理实验的多像素成像仪,以及必须通过高通量辐射和较大的轨道温度变化而得以生存的复杂空间电子设备。

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