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Understanding Creep Corrosion Field Fails

机译:了解蠕变腐蚀场失败

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Dendrites, Electrochemical Migration (ECM) and parasitic leakage, are usually caused by process related contamination. For example, excess flux, poor handling, extraneous solder, fibers, to name a few. One does not normally relate these fails with environmental causes. However, creep corrosion is a mechanism by which electronic products fail in application, primarily related to sulfur pollution present in the air.1 The sulfur reacts with exposed silver, and to a lesser extent, exposed copper. This paper will explore various aspects of the creep corrosion chemical reaction: 1.What is driving the creep corrosion reaction? 2.Why is drying the product a necessary precursor to obtaining creep corrosion in tests?2, 3 3.Test methods with Flowers of Sulfur, FoS, and sulfur rich clay. 4.Discussion of creep corrosion related field fails. 5.When does creep corrosion become ECM. 6.Sources of sulfur containing pollution. 7.Methods to take to avoid creep corrosion. While there are places with sulfur containing pollution, creep corrosion will be a factor which will impact reliability. Creep corrosion will need to be understood and handled.
机译:树突,电化学迁移(ECM)和寄生泄漏通常是由与工艺相关的污染引起的。例如,过量的助焊剂,不良的处理,多余的焊料,纤维等。人们通常不会将这些失败与环境原因联系起来。但是,蠕变腐蚀是电子产品无法应用的一种机制,主要与空气中存在的硫污染有关。 1 硫与裸露的银反应,在较小程度上与裸露的铜反应。本文将探讨蠕变腐蚀化学反应的各个方面:1.什么驱动蠕变腐蚀反应? 2.为什么干燥产品是测试中获得蠕变腐蚀的必要先兆? 2、3 3.使用硫,FoS和富硫粘土花的测试方法。 4.讨论蠕变腐蚀相关领域失败。 5.蠕变腐蚀何时变为ECM。 6.含硫污染源。 7.避免蠕变腐蚀的方法。尽管有些地方含硫污染,但蠕变腐蚀将成为影响可靠性的一个因素。蠕变腐蚀将需要理解和处理。

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