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Organic transistor technology options for device performance versus technology options for increased circuit reliability and yield on foil

机译:有机晶体管技术选项,用于设备性能与技术选择增加电路可靠性和箔上的收益率

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Last year, advances in organic device technology (such as device scaling, high K-dielectrics [1], ...) enabled a substantial progress in performance. This resulted in an increase in the data rate of plastic transponder circuits from about 2 kbit/s [2] to EPC-compatible speeds (50 kbit/s). The organic semiconductor pentacene deposited from solution was replaced by a better-performing vapor-phase deposited pentacene, with a mobility being a factor of 3 higher. The isolation of pentacene transistors in this new process is achieved by an integrated shadow mask, shown in Fig. 1, that results in a reliable isolation of the semiconductor area testified by off-currents below 10pA. We replaced the organic polymer (low-k) dielectric with a 100-nm thick high-k dielectric, sputtered Al_2O_3, resulting in an 8-fold higher specific accumulation capacitance. That, in turn, allowed for downscaling the transistor channel length from 5μm to 2μm, while maintaining a high output resistance in saturation - and therefore also high inverter gain and noise margins. A cross-section of this process flow is depicted in Fig. 1. Fig. 2 shows a micrograph image of a 5-stage ring oscillator realized in this technology on foil optimized for speed. This organic thin-film circuit technology allows to design with lower overlap capacitance and to downscale the transistor channel length, within the boundaries achievable by existing high-throughput manufacturing tools (e.g. steppers used in backplane manufacturing). In this work, we varied the channel lengths (L) of the TFTs in the circuits between 20μm and 2μm and limited the gate-source and gate-drain overlap capacitances by decreasing the width of the finger-shaped source and drain contacts, that fully overlap the gate, from 5μm to 2μm. Fig. 2 shows a micrograph image of one transistor. Typical transfer curves of transistors fabricated in this technology, having L = 5μm and 2μm, are depicted in Fig. 3 and Fig. 4 respectively. The transistors are normally-on and their charge carrier (hole) mobility exceeds 0.5cm~2/Vs. Fig. 5 shows typical transfer curves of a zerovgs-load inverters with channel lengths of 5μm and 2μm. The ratio between drive and load transistor is 10:1. The inverters have high gains and noise margins. The stage delay (τ_D) of inverters in this technology is plotted as a function of the supply voltage in Fig. 6. The stage delay is determined from 19-stage ring oscillators. The figure shows τ_D for inverters with channel lengths from 20μm to 2μm and gate-overlap of the transistor-fingers ranging from 5μm to 2μm. Stage delays below 1μs, and as low as 400ns, are shown at V_(DD)=10V. To our knowledge, no plastic technology was shown before with such speeds at these low power voltages. The effect of decreasing the overlap capacitance is also shown for the two smaller channel lengths: shrinking the overlap from 5μm to 2μm improves the stage delay by a factor of 1.5 to 2. We proceeded with the design and realization of 8bit organic RFID transponder chips, having a channel length of 2μm and either 5μm or 2μm finger widths. Figs. 7 and 8 show the photographs of the 6" wafer and a zoom of the die, Fig. 9 shows the corresponding schematic. Fig. 11 depicts the output signal of both types of transponders. In agreement with the two-fold faster inverter stage delay for the 2μm fingers, the data rate of this transponder is also twice as high as that of the design with 5μm fingers. The obtained data rate of the 8bit transponder with channel length and fingers of 2μm is a record 50kb/s.
机译:去年,在有机器件技术的进步(如设备结垢,高K值电介质[1],......)使能的性能实质性进展。这导致约2千比特在塑料应答器电路的数据速率的增加/ S [2]至EPC兼容的速度(50千比特/秒)。从溶液中沉积有机半导体并五苯通过一个性能更好的气相沉积并五苯代替,其中移动性是3更高的一个因素。并五苯晶体管在这个新方法中的隔离是通过一个集成的荫罩,在图1中所示的实现的,即导致半导体区域的可靠隔离作证由下面10pA的截止电流。我们取代了的有机聚合物(低k)用100纳米厚的高k电介质的介电,溅射Al_2O_3的,导致8倍高的特异性蓄积电容。即,反过来,允许缩减从5μm至2μm的晶体管沟道长度,同时保持在饱和度的高输出电阻 - 并且因此也高逆变器的增益和噪声容限。该处理流程的横截面是图1图2示出在该技术中对箔优化速度实现5级的环形振荡器的显微图像中描绘。该有机薄膜电路技术允许以较低的重叠电容的设计和来缩减晶体管沟道长度,通过现有的可达到的范围内的高通量的制造工具(例如,在背板制造中使用步进器)。通过降低指形源极和漏极触点的宽度。在这项工作中,我们改变TFT的沟道长度(L)在20微米和2微米和栅极 - 源极有限的,之间的电路栅 - 漏重叠电容,即充分重叠栅极,从5μm至2微米。图2示出了一个晶体管的显微照片图像。晶体管的典型转移曲线制作在该技术中,具有L = 5微米和2微米,在图3和图4分别示出。晶体管是常导通和它们的电荷载体(空穴)迁移率超过0.5厘米〜2 / Vs以上。图5微米与2微米和的信道长度a zerovgs负载的逆变器的图5示出典型转移曲线。驱动器和负载晶体管之间的比率为10:1。该逆变器具有高增益和噪声容限。在该技术中的逆变器的级延迟(τ_D)被绘制为图1中的电源电压的函数。6.级延迟是从19级环形振荡器确定。由图可见τ_D用于与沟道长度的反相器从20微米到晶体管-指范围从5μm至2微米的2微米和栅极重叠。阶段延迟下面为1μs,以及低至为400ns,在V_(DD)= 10V被示出。据我们所知,没有任何塑料技术与这样的速度,在这些低功率电压前所示。还示出了两个较小的沟道长度减小重叠电容的效果是:从5微米收缩重叠,以2μm的提高了的1.5至2倍,我们继续进行的8位有机RFID应答器芯片的设计和实现的级延迟,为2μm和5μm的任一或2μm的手指宽度的沟道长度。图。图7和8示出了6" 晶片和模具的放大,图6的照片。图9示出的对应的示意图。图11描绘两种类型的应答器的输出信号,与在协议两倍快逆变器级延迟为2μm的手指,这发射机应答器的数据速率也是两倍高,与5μm的手指的设计,与沟道长度和为2μm的手指8位应答器将所得到的数据速率是一个记录50KB /秒。

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