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13.5 A 512Gb 3-bit/Cell 3D Flash Memory on 128-Wordline-Layer with 132MB/s Write Performance Featuring Circuit-Under-Array Technology

机译:13.5个512Gb 3字元/单元的512Gb 3位/单元3D闪存,具有132MB / s的写入性能,采用电路下阵列技术

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Advancements in 3D-Flash memory-layer-stacking technology has enabled density scaling that circumvents the lithography limitations which have prevented 2D-NAND Flash memory from scaling [1]. Bit densities as high as 5.95Gb/mm2 on a single die were recently reported [2], where a 512Gb NAND Flash was built on 96 layers of memory. As memory density increases, with memory layers increasing from 96 layers to 128 layers, higher bit density can be achieved by adopting larger capacity die; however, NAND performance per bit density is reducing with the 2-plane architecture. In this work, we propose a 512Gb 3b/cell 128WL-layer NAND Flash, with a bit density of 7.80Gb/mm2: a 31% improvement over the previously reported. Three key performance improving technologies have been implemented. (1) A 4-plane architecture with circuit under array (CUA) technology to improve performance per bit density. (2) A multi-die peak-power management (PPM) system to manage peak-power consumption in the system, via the ZQ pin. (3) A 4KB-page-read mode to reduce power consumption. Figure 13.5.1(a) summarized the key features and Fig. 13.5.1(b) shows the die photograph and the floorplan for this work. Figure 13.5.2 shows a table comparing this work to previous work.
机译:3D-Flash存储器层堆叠技术的进步使密度缩放成为可能,从而规避了光刻限制,光刻限制使2D-NAND Flash存储器无法缩放[1]。比特密度高达5.95Gb / mm 2 最近有报道称在单个芯片上有一个[2],其中在96个内存层上构建了512Gb NAND闪存。随着存储密度的增加,随着存储层从96层增加到128层,采用更大容量的裸片可以实现更高的位密度。但是,随着2平面架构的发展,每比特密度的NAND性能正在下降。在这项工作中,我们提出了一个512Gb 3b /单元128WL层NAND闪存,其比特密度为7.80Gb / mm 2 :比以前的报告提高了31%。已经实施了三项关键的性能改进技术。 (1)具有平面下电路(CUA)技术的4平面体系结构,可提高每位密度的性能。 (2)多管芯峰值功率管理(PPM)系统,用于通过ZQ引脚管理系统中的峰值功率消耗。 (3)4KB页面读取模式以减少功耗。图13.5.1(a)总结了关键特征,图13.5.1(b)显示了此工作的模具照片和平面图。图13.5.2显示了一个表,将该工作与以前的工作进行了比较。

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