首页> 外文会议>ASME international mechanical engineering congress and exposition >CRYSTALLINITY-INDUCED VARIATION OF THE ELECTRONIC CHARACTERISTICS OF ELECTROPLATED GOLD THIN FILMS
【24h】

CRYSTALLINITY-INDUCED VARIATION OF THE ELECTRONIC CHARACTERISTICS OF ELECTROPLATED GOLD THIN FILMS

机译:结晶度诱导的电镀金薄膜电子特性的变化

获取原文

摘要

Electroplated gold thin films have been used for micro bumps in flip chip packing structures. However, it has been reported that physical properties and micro texture of the electroplated thin films vary drastically comparing with those of conventional bulk material, depending on their electroplating process. In addition, since one bump is going to consist of a few grains or a single grain due to the miniaturization of the 3D structures, it shows strong anisotropic mechanical properties because a face-centered cubic crystal essentially has strong anisotropy of physical properties. Therefore, there should be the wide distribution of characteristics of the micro bumps depending on their micro structure and the variation of the crystallinity of grains and grain boundaries enlarges the width of the distributions of various properties. Particularly, it was found that the long-term reliability of micro bumps and interconnections is degraded drastically by porous grain boundaries with a lot of defects because of the acceleration of atomic diffusion along the porous grain boundaries under the application of high current density (electromigration) and high mechanical stress (stress-induced migration). In this study, the effect of crystallinity, in other words, the order of atom arrangement of grain boundaries in electroplated gold thin films on the EM resistance was investigated experimentally. The crystallinity of the gold thin films was varied drastically by changing the under-layer material used for electroplating; such as Cr (30 nm) / Pt (50 nm)/ Au (200 nm) and Ti (50 nm) / Au (100 nm). The mechanical properties of the electroplated gold thin films were measured by using a nano-indentation test. Also, the micro textures such as crystallinity and crystallographic orientation of gold thin films were investigated by EBSD (Electron Back-Scatter Diffraction) and XRD (X-Ray Diffraction). It was clarified that the crystallinity of the electroplated gold thin films changed drastically depending on the crystallinity of the under-layer materials and heat treatment conditions after electroplating. This variation of the crystallinity should have caused the wide variation of mechanical properties of the electroplated gold films. Therefore, it is very important to control the crystallinity of the under layer used for electroplating in order to control the mechanical properties and reliability of the electroplated gold thin films.
机译:电镀金薄膜已被用于倒装芯片包装结构中的微凸块。然而,据报道,根据其电镀工艺,电镀薄膜的物理性质和微观纹理与常规散装材料的物理性质和微观纹理变化。另外,由于一个凸块由于3D结构的小型化而包括少量谷物或单粒颗粒,所以它显示出强的各向异性机械性能,因为面为中心的立方晶体基本上具有强烈的物理性质各向异性。因此,根据其微观结构,应该存在微凸块的特性的广泛分布,并且晶粒和晶界的结晶度的变化扩大了各种性质的分布的宽度。特别地,发现微凸块和互连的长期可靠性通过多孔晶界性具有大量缺陷的多孔晶界,由于在高电流密度(电迁移)下的多孔晶界沿着多孔晶界的加速度和高机械应力(应力诱导的迁移)。在本研究中,实验研究了结晶度的影响,换句话说,换句话说,在EM电阻上的电镀金薄膜中的晶界的原子排列顺序。通过改变用于电镀的下层材料,金薄膜的结晶度急剧变化;如Cr(30nm)/ pt(50nm)/ au(200nm)和ti(50nm)/ au(100nm)。通过使用纳米缩进试验测量电镀金薄膜的机械性能。此外,通过EBSD(电子背散射衍射)和XRD(X射线衍射)研究了金薄膜的结晶度和结晶取向的微纹理。阐明了电镀金薄膜的结晶度根据层内材料和电镀后的热处理条件的结晶度而变化。结晶度的这种变化应该引起电镀金膜的机械性能的宽变化。因此,控制用于电镀的下层的结晶度是非常重要的,以控制电镀金薄膜的机械性能和可靠性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号