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Freestanding optical micro-disk resonators in single-crystal diamond by reactive ion etching and multidirectional focused ion-beam milling

机译:通过反应离子刻蚀和多方向聚焦离子束铣削的单晶金刚石独立式光学微盘谐振器

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We present a fabrication method to obtain freestanding optical microcavities in Single Crystal Diamond (SCD), based on a combination of Reactive Ion Etching (RIE) and multidirectional Focused Ion Beam (FIB) milling, and we report for the first time experimental optical characterization of freestanding diamond optical microdisk resonators obtained by this fabrication method. Patterning of the optical microcavities is achieved by contact photolithography on single crystal CVD diamond plates (3 mm × 3 mm × 0.15 mm), using a SiO_2 hard mask and optimized O_2 diamond plasma etching, resulting in multiple circular pillars in a single etch step. Individual pillars are subsequently undercut by multi-directional FIB milling from two orthogonal directions, shaping the anchor to the bulk substrate. Sequential FIB thinning and smoothing of the disks allows obtaining freestanding optical microcavities. During FIB milling, an Al/Cr layer (50 nm/75 nm) is used to ground the diamond substrate, simultaneously limiting ion implantation and reducing FIB induced edge rounding. We experimentally probe the cavities by a tunable laser, coupled to the resonator by a tapered single mode fiber. The spectral response of a typical microdisk (diameter 5.9 μm, thickness 800 nm) in transmission over the tuning range of the laser (1485 nm to 1550 nm) reveals multiple optical resonances with a Free Spectral Range of 52.5 nm and optical Q-factors attaining up to 1500 (at 1496 nm). To our knowledge, this is the first time that freestanding optical microdisk resonators are demonstrated in Single Crystal Diamond by a combination of RIE and multidirectional FIB milling, providing a path for high-Q optical cavities in diamond.
机译:我们结合反应性离子刻蚀(RIE)和多向聚焦离子束(FIB)铣削技术,提出了一种在单晶金刚石(SCD)中获得独立光学微腔的制造方法,并且首次报道了该晶体的实验光学特性通过这种制造方法获得的独立式金刚石光学微盘谐振器。通过使用SiO_2硬掩模和优化的O_2金刚石等离子刻蚀在单晶CVD金刚石板上(3 mm×3 mm×0.15 mm)进行接触光刻,可以对光学微腔进行图案化,从而在单个刻蚀步骤中形成多个圆形柱体。随后通过从两个正交方向进行的多方向FIB铣削对单个支柱进行底切,从而将锚定为块状基材。依次对光盘进行FIB减薄和平滑处理可以获得独立的光学微腔。在FIB铣削过程中,使用Al / Cr层(50 nm / 75 nm)来研磨金刚石基底,同时限制离子注入并减少FIB引起的边缘倒圆。我们通过可调谐激光器实验性地探测空腔,并通过锥形单模光纤耦合到谐振器。典型微盘(直径5.9μm,厚度800 nm)在激光器的调谐范围(1485 nm至1550 nm)中透射时的光谱响应显示出多个光学共振,其自由光谱范围为52.5 nm,并获得了光学Q因子高达1500(在1496 nm下)。据我们所知,这是首次通过RIE和多方向FIB铣削的结合在单晶金刚石中展示独立式光学微盘谐振器,从而为金刚石中的高Q光学腔提供了路径。

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