Co-Cr PERPENDICULAR MAGNETIC RECORDING MEDIA PREPARED BY SPUTTERING USING ECR MICROWAVE PLASMA

摘要

In order to improve the recording resolution of Co-Cr perpendicular magnetic recording medium, it is necessary to eliminate an initial layer. To achieve this, the underlayer such as Ti and Cr which plays a roll to control crystal orientation of Co-Cr film is introduced in the conventional diode sputtering methods. Sputtering deposition using an electron cyclotron resonance (ECR) microwave plasma has advantages over the conventional diode sputtering, i.e. generation of highly ionized plasma even at low Ar gas pressure, and its controllable irradiation to the substrate [1-5]. In this study, we tried to fabricate the Co-Cr perpendicular magnetic recording media without initial layer using the ECR sputtering by controlling the ion irradiation.