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Near-threshold SRAM design with dynamic write-assist circuitry

机译:具有动态写辅助电路的近阈值SRAM设计

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Increasing process variation and reducing supply voltage can significantly degrade the write-ability of near-threshold SRAM cells. Meanwhile, the dynamic write assisting techniques and the high write latency at near-threshold Vdd makes the traditional static performance metrics no longer capable. In this paper, we adopt transient negative bit-line voltage technique (T-NBL) to improve cell write-ability without disturb the read ability and data retention ability. And we propose a new set of performance metrics to fully access the performance of SRAM cells considering the dynamic nature of the write operation. Meanwhile, the efficient robustness consideration has been included. Statistical simulations with a 40nm technology design verify the proposed performance metrics.
机译:工艺变化的增加和电源电压的降低会大大降低接近阈值的SRAM单元的可写性。同时,动态写辅助技术和接近阈值Vdd的高写延迟使传统的静态性能指标不再有效。在本文中,我们采用瞬态负位线电压技术(T-NBL)来提高单元的可写性,而不会影响读取能力和数据保留能力。考虑到写操作的动态特性,我们提出了一套新的性能指标来完全访问SRAM单元的性能。同时,有效的鲁棒性考虑也已包括在内。采用40纳米技术设计的统计仿真可验证所提出的性能指标。

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