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Double-gate Ge, In As-based tunnel FETs with enhanced ON-current

机译:具有增强的导通电流的双栅极Ge,In As基隧道FET

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In this correspondence, a novel approach to enhance ON-current in Tunnel Field Effect Transistor (TFET) using Synopsys Sentaurus TCAD simulation has been proposed. In this paper, we proposed Ge-based, InAs-based double-gate Tunnel FETs (DGTFETs), for which the simulations show significant enhancement in ON-current when compared with single-gate Tunnel FETs. The both DGTFETs fulfills the high-performance ON-current is 0.85 mA for Ge DGTFET, 11.8 mA for InAs DGTFET and low-stand-by power OFF-current nearly 10 15 A for both transistors, an ION /IOFF ratio is found to be more than 1012 for both transistors, which shows Tunnel FET devices are suitable candidates to meet ITRS low-off-state-power specifications. InAs-based (narrow band-gap material) DGTFET shows more ON-current when compared with Ge-based DGTFET. The best attractive result of our structure is III-V compound semiconductor TFETs, which are suitable for low power electronics with high-ON current.
机译:在这种对应关系中,已经提出了一种使用Synopsys Sentaurus TCAD模拟来增强隧道场效应晶体管(TFET)中的电流的新方法。在本文中,我们提出了基于GE的基于INA的双栅极隧道FET(DGTFET),其中模拟与单栅隧道FET相比,在电流中显示出显着的增强。两种DGTFET满足GE DGTFET的高性能电流为0.85 mA,对于INAS DGTFET,11.8 mA,对于两个晶体管,近10 15 A的低架电源关闭电流近10个15A,发现了ION / IOFF比率两个晶体管的1012多个显示隧道FET器件是合适的候选者,以满足ITRS脱截止状态功率规格。与基于GE的DGTFET相比,基于INAS的(窄带间隙材料)DGTFET显示更多的电流。我们结构的最佳吸引力结果是III-V复合半导体TFET,适用于具有高电流的低功率电子器件。

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