Fabrication of ultralarge single order diffraction grating for soft X-ray monochromator

摘要

In this work, we present the fabrication process of a large area (100mm¿¿40mm) and thick (30mm) single order diffraction grating for a 10¿¿¿1000eV soft X-ray monochromator. Three types of diffraction gratings were integrated on one single piece of bulk silicon. The gratings were patterned on a 4 inch silicon wafer using direct e-beam writing with SAL-601. The wafer was etched and diced into a 100mm¿¿40mm¿¿0.5mm slice, and this slice is bonded to a bulk silicon using low temperature Au-Au bonding technology. The performance of this grating is tested in soft X-ray region.