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Dark current analysis of P-type and N-type pixels under total ionizing dose radiation effects

机译:总电离剂量辐射效应下P型和N型像素的暗电流分析

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In this paper, a custom-designed CMOS image sensor (CIS) is proposed with N-type and P-type pixels fabricated on one chip. A Co radiation experiment is implemented on the proposed CIS chip. Measurement results shows that the P-type pixels have good total ionizing dose (TID) radiation tolerance with less radiation induced dark current compared with N-type pixels. But the dark current nonuniformity of P-type pixels is observed to be enhanced more than N-type ones by TID radiation effect.
机译:本文提出了一种定制设计的CMOS图像传感器(CIS),其中在一个芯片上制造了N型和P型像素。在拟议的CIS芯片上实施了Co辐射实验。测量结果表明,与N型像素相比,P型像素具有良好的总电离剂量(TID)辐射耐受性,并且辐射诱导的暗电流更少。但是,通过TID辐射效应,可以观察到P型像素的暗电流不均匀性比N型像素得到的增强更多。

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