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A Novel Multi-Functional Silicon-On-ONO (SOONO) MOSFETs for SoC applications: Electrical Characterization for High Performance Transistor and Embeded Memory Applications

机译:用于SOC应用的新型多功能硅 - ONO(扫点)MOSFET:高性能晶体管和嵌入式内存应用的电气表征

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We proposed and successfully demonstrate multi-functional Si-on-ONO (SOONO) MOSFETs. As a high performance transistor and embedded 2-bit flash memory, they show the reasonable characteristics. SOONO MOSFETs act as ultra thin body transistor with self-limited shallow junction, resulting in good SCE immunity and high driving currents, 737μA/μm for nMOS and 330μA/μm for pMOS at 1V{sub}(GS)1=1V{sub}(DS)1=1V, I{sub}(OFF)=100nA/μm). In terms of flash memory, SOONO MOSFET acts as 2-bit flash memory with 2 physically separated storage node in back side. By using CHEI/HHI program/erase, each node was easily programmed and erased. In the gate length of 120nm, we achieved the read/write margins of ~1.3 V at V{sub}(DS)=1.2V and the V{sub}(TH) shifts of ~2.5V for both program/erase.
机译:我们提出并成功地展示了多功能的SI-ON-ONO(扫)MOSFET。作为高性能晶体管和嵌入式2位闪存,它们显示了合理的特性。 MOSFET作为超薄体晶体管,具有自限浅结,导致良好的SCE免疫和高驱动电流,对于1V {SUB}(GS)1 = 1V {SUB},PMOS的NMOS和330μA/μm为330μA/μm。 (DS)1 = 1V,I {Sub}(OFF)= 100NA /μm)。在闪存方面,MOSFET休闲用作2位闪存,背面有2个物理分离的存储节点。通过使用CHEI / HHI程序/擦除,每个节点都很容易编程和擦除。在120nm的栅极长度中,我们在v {sub}(ds)= 1.2V和v {sub}(th)偏移对于程序/擦除时,实现了〜1.3v的读/写边缘。

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