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Study on Defective Elements from Indium Bump Preparation in Focal Plane Array Fabrication

机译:焦平面阵列制造中铟凸块制剂的缺陷元件研究

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The defective elements from indium bump preparation in FPA fabrication are tested by optical microscopy and FPA testing bench. Results show that the defective elements from indium bump fabrication include connecting defective elements and missing defective elements. It is easy to identify missing defective elements by FPA testing bench because the response voltage of defective elements is zero and response voltage of other elements around defective element is higher than that of normal elements. And it is difficult to identify connecting defective elements by FPA testing bench because the response voltage of connecting defective elements is basically the same as that of normal elements. The defective elements from indium bump fabrication are due to the indium bump with connecting or missing caused by the process of photolithography, eroding and lift-off. Fabrication process such as photolithography, eroding and lift-off is optimized to reduce defective elements from indium bump fabrication.
机译:通过光学显微镜和FPA测试台,测试来自FPA制造中的铟凸块制剂的缺陷元件。结果表明,抗损伤制造的缺陷元件包括连接有缺陷的元件和缺失的缺陷元件。通过FPA测试台识别缺失的有缺陷元件,因为有缺陷元件的响应电压为零并且缺陷元件周围的其他元件的响应电压高于正常元素的响应电压。并且难以通过FPA测试台识别连接有缺陷的元件,因为连接有缺陷元件的响应电压与正常元素的响应电压基本相同。来自铟凸块制造的缺陷元件是由于光刻,腐蚀和剥离过程引起的连接或缺失的铟凸块。优化诸如光刻,腐蚀和剥离的制造过程,以减少铟凸块制造的缺陷元件。

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