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A study on the preparation of diamond like carbon film and its electrodes

机译:类金刚石碳膜的制备及其电极的研究

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Diamond-like carbon (DLC) films have attracted much attention because of their excellent performance; however, the low anti-laser damage ability of such films seriously restricts their applicability. To overcome this problem, applying the bias field to the DLC film could slow down the DLC film graphitization process and improve the LIDT of the DLC film. Results showed that the longitudinal electric field could decrease the sp3 hybridization to sp~2 hybridization, prevent the formation of sp~2 clusters, in this study, Unbalanced magnetron sputtering (UBMS) was used to deposit a diamond-like carbon (DLC) film on Si substrates. The refractive index and extinction coefficient of the DLC films were measured using elliptical polarization spectrometer. The transmittance and the surface roughness of DLC films were examined using optical microscopy, SEM, AFM and Raman spectroscopy. Ti electrodes were deposited on DLC films directly, forming a transverse and longitudinal bias field on films' surfaces. The 3D electrodes morphology of the DLC film was observed. The electrode thickness was measured by a white-light interferometer, and the average thickness of the electrodes was 325.90 nm. The surface roughness of the electrodes was tested using the Talysurf CCI 2000 noncontact surface-measuring instrument, and the average roughness of the electrodes was 0.50 nm. The electrodes have good Ohmic contact and little thermal stress, and it can be used to form a parallel electric field.
机译:类金刚石碳(DLC)膜由于其出色的性能而备受关注。但是,这种膜的抗激光损伤能力低,严重限制了其适用性。为了克服这个问题,将偏磁场施加到DLC膜上可以减慢DLC膜的石墨化过程并改善DLC膜的LIDT。结果表明,纵向电场可以将sp3杂化减少为sp〜2杂化,阻止sp〜2簇的形成,本研究采用不平衡磁控溅射(UBMS)沉积类金刚石碳(DLC)膜在硅衬底上。使用椭圆偏振光谱仪测量DLC膜的折射率和消光系数。使用光学显微镜,SEM,AFM和拉曼光谱检查DLC膜的透射率和表面粗糙度。钛电极直接沉积在DLC膜上,在膜表面形成横向和纵向偏置场。观察到DLC膜的3D电极形态。通过白光干涉仪测量电极厚度,并且电极的平均厚度为325.90nm。使用Talysurf CCI 2000非接触式表面测量仪测试电极的表面粗糙度,并且电极的平均粗糙度为0.50nm。电极具有良好的欧姆接触,热应力小,可用于形成平行电场。

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