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First-principles simulations of 2-D semiconductor devices: Mobility, I-V characteristics, and contact resistance

机译:二维半导体器件的第一性原理模拟:迁移率,IV特性和接触电阻

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We report in this paper ab-initio quantum transport simulations of different types of single-layer 2-D semiconductors: transition metal and group IV dichalcogenides in the 2H or 1T phase as well as black phosphorus. The electron and hole phonon-limited mobilities of eight selected 2-D crystals are first analyzed before using these materials as n- or p-type channels of ultra-scaled single-gate transistors, computing their I-V characteristics in the presence of electron-phonon scattering, and comparing them to each other. Finally, the properties of metal-MoS2 contacts are investigated. It is revealed that the current tends to flow at the edge of the metal layer before entering the semiconductor, thus limiting the injection efficiency.
机译:我们在本文中报道了不同类型的单层2-D半导体的从头算量子传输模拟:2H或1T相中的过渡金属和IV组二硫代双氰化物以及黑磷。在使用这些材料作为超规模单栅极晶体管的n或p型通道之前,首先要分析八个选定的2-D晶体的电子和空穴声子极限迁移率,并在存在电子声子的情况下计算其IV特性。分散,并将它们彼此进行比较。最后,研究了金属-MoS2触点的性能。揭示了电流趋于在进入半导体之前在金属层的边缘流动,从而限制了注入效率。

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