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The influence of gas pressure, voltage and frequency on plasma propagation in tube

机译:气压,电压和频率对等离子体在管内传播的影响

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Summary form only given. The influence of gas pressure and electrical parameters on low pressure plasma in tube has been investigated. The gas pressure has a great influence on both the length of the plasma and the propagation velocity of the plasma bullet. Both the length of plasma jet and the velocity of plasma bullet increase firstly and then decreases with the increase of gas pressure from 15 Pa to 15000 Pa. The plasma length achieves maximum at 100 Pa with a propagation velocity about 5×106 m/s. Relative to voltage, the frequency of applied pulse voltage has different impact on the plasma propagation at different gas pressure. While higher voltage induces longer plasma and faster propagation velocity at both 30 Pa and 2000 Pa, increasing frequency has little influence on plasma at 30 Pa but reduces the plasma length and propagation velocity observably at 2000 Pa. In addition, an exotic plasma plume structure is observed by a fast intensified charge-coupled device (ICCD). A possible hypothesis is discussed here to explain this phenomenon. These works may lead to a more precise controlling of low pressure plasma, warranted for advanced materials technologies.
机译:仅提供摘要表格。研究了气体压力和电学参数对管内低压等离子体的影响。气压对等离子体的长度和等离子体子弹的传播速度都具有很大的影响。随着气体压力从15 Pa增加到15000 Pa,等离子体射流的长度和等离子体子弹的速度都先增大然后减小。在100 Pa下,等离子体长度达到最大值,传播速度约为5×106 m / s。相对于电压,施加的脉冲电压的频率对在不同气压下的等离子体传播具有不同的影响。虽然较高的电压在30 Pa和2000 Pa时会引起更长的等离子体和更快的传播速度,但增加频率对30 Pa时的等离子体几乎没有影响,但是在2000 Pa时可观察到的等离子体长度和传播速度明显减小。此外,奇特的等离子体羽流结构是通过快速增强的电荷耦合器件(ICCD)观察到。这里讨论一个可能的假设来解释这种现象。这些工作可能会导致对低压等离子体的更精确控制,这是先进材料技术所保证的。

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