Laser cooling for Si atom manipulation with atomic mirror

摘要

Highly efficient frequency conversions were conducted to obtain a deep-ultraviolet single-mode coherent light using two-stage external cavities. 154-mW power at around 252 nm was obtained with a conversion efficiency of more than 8% by doubly resonant sum-frequency mixing of 373-nm light from the first-stage conversion and 780-nm light from a single-mode Ti: sapphire laser. The output performances of the deep-ultraviolet light source are sufficient for realizing the laser cooling of neutral silicon atoms and then their manipulation with an atomic mirror.