Photonic structures in photoresist and PDMS surface patterned by AFM lithography

摘要

This contribution demonstrates surface modification of thin photoresist layers and polydimethylsiloxane (PDMS) surfaces with spatial resolution better than 20 run. We provided few different 2D arrangements of surface patterning with aim to prepare 2D photonic structures with various symmetries in the thin S1828 photoresist layer using AFM lithography. Consequently, we used the imprinting technique for transferring the photoresist pattern to the PDMS membrane surface. Finally, prepared 2D photonic structures in photoresist and PDMS surfaces are characterized by AFM.