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Comprehensive investigation and design of Tunnel FET-based SRAM

机译:基于隧道FET的SRAM的综合研究与设计

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In this work, the impacts of electrical characteristics of Tunnel FET (TFET) on the SRAM design are systemically investigated for the first time from the perspective of memory array. A novel 10T TFET SRAM design is also proposed to overcome the challenges and improve the circuit stability. By using a calibrated compact model, the simulated static power of 10T TFET SRAM can be much lower than traditional 6T MOSFET SRAM, especially at the low supply voltage of 0.5V. In addition, the cell's stability is also largely improved with the largest noise margin compared with reported 7T TFET SRAM design and traditional 6T MOSFET SRAM.
机译:在这项工作中,首次从存储阵列的角度系统地研究了隧道FET(TFET)的电特性对SRAM设计的影响。还提出了一种新颖的10T TFET SRAM设计,以克服这些挑战并提高电路稳定性。通过使用校准的紧凑模型,10T TFET SRAM的仿真静态功率可以大大低于传统的6T MOSFET SRAM,尤其是在0.5V的低电源电压下。此外,与报道的7T TFET SRAM设计和传统6T MOSFET SRAM相比,该单元的稳定性也得到了极大的改善,并具有最大的噪声容限。

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