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RF-MEMS-platform based on silicon-ceramic-composite-substrates

机译:基于硅陶瓷复合材料基板的RF-MEMS平台

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In the last few years, several Low Temperature Co-fired Ceramics (LTCC) materials with a silicon adapted Coefficient of Thermal Expansion (CTE) have been developed for direct wafer bonding to silicon. BGK (special type designation of Fraunhofer IKTS), a sodium containing LTCC was originally developed for anodic bonding of the sintered LTCC whereas BCT (Bondable Ceramic Tape) tailored for direct silicon bonding of green LTCC tapes to fabricate a quasi-monolithic silicon ceramic compound substrate. This so-called SiCer technique is based on homogeneous nano-structuring of a silicon substrate, a lamination step of BCT and silicon and a subsequent pressure assisted sintering. We present a new approach for an integrated RF-platform-setup combining passive, active and mechanical elements on one SiCer substrate. In this context RF parameters of the silicon adapted LTCC tapes are investigated. We show first technological results of creating cavities at the silicon ceramic interface for SiCer-specific contacting options as well as windows in the ceramic layer of the SiCer substrate for additional silicon processing. A further investigated platform technology is deep reactive ion etching of the silicon-ceramic-composite-substrate. The etching behavior of silicon on BCT will be demonstrated and discussed. With the SiCer technique it is possible to reduce the silicon content at the setup of RF MEMS to a minimum (low signal damping).
机译:在过去的几年中,已经开发了几种具有硅适应热膨胀系数(CTE)的低温共烧陶瓷(LTCC)材料,用于将晶圆直接粘合到硅上。 BGK(弗劳恩霍夫IKTS的特殊类型名称)是最初用于烧结LTCC的阳极粘结的含钠LTCC,而BCT(可粘结陶瓷带)则专门用于绿色LTCC带的直接硅粘结以制造准单片硅陶瓷复合材料基底。这种所谓的SiCer技术基于硅基板的均匀纳米结构,BCT和硅的层压步骤以及随后的压力辅助烧结。我们提出了一种在一个SiCer基板上结合无源,有源和机械元件的集成RF平台设置的新方法。在这种情况下,研究了硅适应的LTCC胶带的RF参数。我们展示了在SiCer特定的接触选项的硅陶瓷界面处形成空腔以及在SiCer基板的陶瓷层中用于其他硅加工的窗口的第一个技术成果。进一步研究的平台技术是硅陶瓷复合材料基板的深反应离子刻蚀。将说明和讨论硅在BCT上的蚀刻行为。利用SiCer技术,可以将RF MEMS装置中的硅含量降至最低(低信号阻尼)。

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