t variation, and wire routing resistance and capaci'/> 24.2 A 7nm 2.1GHz Dual-Port SRAM with WL-RC Optimization and Dummy-Read-Recovery Circuitry to Mitigate Read- Disturb-Write Issue
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24.2 A 7nm 2.1GHz Dual-Port SRAM with WL-RC Optimization and Dummy-Read-Recovery Circuitry to Mitigate Read- Disturb-Write Issue

机译:24.2 A 7NM 2.1GHz双端口SRAM,具有WL-RC优化和虚拟读回恢复电路,以减轻读干扰写入问题

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摘要

Continued transistor scaling increases random Vt variation, and wire routing resistance and capacitance; it degrades SRAM performance and results in SRAM design difficulties. Although dual-port (DP) SRAM is useful, because it can offer simultaneous read and write operations with two asynchronous clocks, circuit design is more complex than for a single-port (SP) SRAM when considering worst-case operation. In particular, WL resistance and capacitance (RC) degradation caused by process scaling and read-disturb-write (RDW) problem in a DP-SRAM bitcell are major challenges for DP-SRAM design in advanced technology nodes.
机译:持续晶体管缩放增加随机V t 变化和电线路线电阻和电容;它降低了SRAM性能并导致SRAM设计困难。虽然双端口(DP)SRAM很有用,但它可以提供具有两个异步时钟的同时读写操作,电路设计比考虑最坏情况下的单端口(SP)SRAM更复杂。特别地,DP-SRAM位点中的过程缩放和读干扰写入(RDW)问题引起的WL电阻和电容(RC)劣化是高级技术节点中DP-SRAM设计的主要挑战。

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