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Single-implant, field plate and guard rings assist multi-zone graded JTE for 4H-SiC p-i-n diodes

机译:单植入物,场板和保护环可为4H-SiC p-i-n二极管提供多区域分级JTE

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摘要

A novel edge termination, referred to as single-implant, field plate (fp) and guard rings (gr) assist two-zone graded junction termination extension (fpgr-assist JTE), is presented for 4H-SiC p-i-n diodes to extend the JTE dose window. The new termination can extend and combine the split window of two-zone graded JTE just using the same fabrication process of conventional single-implant two-zone graded JTE. Optimum JTE dose window (>4000V) is significantly extended by a ratio of 76.9%.
机译:提出了一种新颖的边缘终端,称为单植入,场板(fp)和保护环(gr)辅助两区渐变结终端扩展(fpgr辅助JTE),用于4H-SiC引脚二极管以扩展JTE。剂量窗口。只需使用与传统单植入物两区渐变JTE相同的制造工艺,新的终端就可以扩展和组合两区渐变JTE的分割窗口。最佳JTE剂量窗口(> 4000V)显着延长了76.9%。

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