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High quantum efficiency 200–1000 nm spectral response photodiodes with on-chip multiple high transmittance optical layers

机译:具有片上多个高透射率光学层的高量子效率200–1000 nm光谱响应光电二极管

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High quantum efficiency (QE) 200–1000 nm spectral response photodiodes using on-chip multiple high transmittance optical layers are demonstrated for development of a high sensitivity linear photodiode array (PDA). In this paper, seven types of PDs with an optical layer each having a band-pass filter type transmittance are described. A surface photo-generated carrier drift layer is employed to improve internal QE and stability of sensitivity to UV-light. The average QE of 79% for 200–1000 nm and 84% for 200–380 nm were obtained for the fabricated PDs. In addition, after acceleration UV-light exposure, degradation of QE is below 15% and increment of dark current is less than double.
机译:使用片上多个高透射率光学层的高量子效率(QE)200-1000 nm光谱响应光电二极管已被证明可用于开发高灵敏度线性光电二极管阵列(PDA)。在本文中,将描述七种具有光学层的PD,每种PD具有带通滤光片类型的透射率。使用表面光生载流子漂移层来改善内部QE和对紫外线敏感度的稳定性。对于所制造的PD,获得的平均QE在200–1000 nm范围内为79%,在200–380 nm范围内为84%。另外,在加速紫外线照射后,QE的下降低于15%,暗电流的增量小于两倍。

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