Infrared Transparent Conductive Films

摘要

This paper presents results for films of CuAl_xO_y were deposited on the sapphire by reactive magnetron co-sputtering using DC applied to the high-purity Cu target,RF applied to the high-purity Al target. Copper aluminum oxide film (CuAl_xO_y) is transparent for infrared and conductive. The properties of the films are influenced by the power of sputtering,the thickness of films etc. deposition parameters. It has been found that, by fine-tuning the sputtering parameters, the films with both reasonably low resistance and high transmission can be obtained simultaneously.The relationship between the process parameters and the properties of the films were established, the process parameters is very important for preparation of the films later.The relationship between the average transmittance, electrical conductivity and thickness of the films etc. parameters were set up.