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Low-cost thin-film deposition apparatus for solar applications

机译:用于太阳能的低成本薄膜沉积设备

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Widespread adoption of solar energy technologies, such as solar photovoltaics (PV) and/or photoelectrochemical (PEC) hydrogen fuel production cells, requires low-cost fabrication methods to produce large area devices for solar energy harvesting. Novel thin-film semiconductor materials produced from chemical solution deposition have significant potential to reduce production and manufacturing costs. Ongoing research at James Madison University is focused on the development and fabrication of thin-film semiconductor materials for PV and PEC applications. Thin-film semiconductors, such as BiVO4 and Cu2ZnSnS4, are fabricated by depositing a liquid precursor solution onto a heated substrate using ultrasonic spray pyrolysis, pneumatic spraying, or liquid drop casting. To enable thin-film depositions over larger sample areas, an automated deposition system is being developed. This coating system is comprised of two primary and interacting subsystems: motion and heating control. The motion system controls the path and travel speed of the precursor deposition device, such as the ultrasonic spray nozzle, during the deposition process. During the deposition procedure, the substrates rest on a heated surface, which provides the energy necessary to induce the desired chemical reactions on the substrate and remove unwanted compounds. This surface have a uniform spatial temperature distribution and must be controlled to a constant temperature ranging from 40 °C to 500 °C with a variability of ±4 °C. A specially designed heating plate was designed to meet these requirements. The focus of this work is to design an integrated system that allows a deposition area of 16 in2 to be completed at James Madison University.
机译:诸如太阳能光伏(PV)和/或光电化学(PEC)氢燃料生产电池之类的太阳能技术的广泛采用,要求低成本的制造方法来生产大面积用于太阳能收集的设备。由化学溶液沉积产生的新型薄膜半导体材料具有降低生产和制造成本的巨大潜力。詹姆斯·麦迪逊大学正在进行的研究集中在用于PV和PEC应用的薄膜半导体材料的开发和制造上。薄膜半导体(例如BiVO4和Cu2ZnSnS4)是通过使用超声波喷雾热解,气动喷雾或液滴流延法将液态前体溶液沉积到加热的基板上而制成的。为了能够在更大的样品区域上进行薄膜沉积,正在开发一种自动沉积系统。该涂层系统由两个主要且相互作用的子系统组成:运动和加热控制。运动系统在沉积过程中控制诸如超声波喷嘴之类的前体沉积装置的路径和行进速度。在沉积过程中,基材放置在加热的表面上,该表面提供了在基材上引发所需化学反应并去除不需要的化合物所需的能量。该表面具有均匀的空间温度分布,必须将其控制在40°C至500°C的恒定温度范围内,其变化范围为±4°C。设计了专门设计的加热板来满足这些要求。这项工作的重点是设计一个集成系统,该系统允许在James Madison大学完成16 in 2 的沉积面积。

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