The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

摘要

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a newly commissioned, synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP offers several major advances including objective lenses with 4×NA values from 0.25 to 0.625, flexible, lossless coherence control through a Fourier-synthesis illuminator, a rotating azimuthal plane of incidence up to ±25°, illumination central ray angles from 6 to 10°, and a continuously tunable, EUV illumination wavelength. SHARP is now being used to study programmed and native mask defects, defect repairs, mask architecture, optical proximity correction, and the influence of mask substrate roughness on imaging. SHARP has the ability to emulate a variety of current and future lithography tool numerical apertures, and illumination properties. Here, we present various performance studies and examples where SHARP's unique capabilities are used in EUV mask research.