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Destruction of monocrystalline silicon with nanosecond pulsed fiber laser, accompanied by the oxidation of ablation microparticles

机译:纳秒脉冲光纤激光器对单晶硅的破坏,伴随着烧蚀微粒的氧化

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In this work, we report an observation of process of local destruction monocrystalline silicon with a scanning beam irradiation of pulse ytterbium fiber laser with a wavelength λ = 1062 nm, accompanied by the oxidation of ablation microparticles. It is shown that depending on the power density of irradiation was observed a large scatter size of the microparticles. From a certain average power density is observed beginning oxidation particulate emitted from the surface of the irradiated area. By varying the parameters of the laser beam such as scanning speed, pulse repetition rate, overlap of laser spot, radiation dose can be achieved almost complete oxidation of all formed during the ablation of microparticles.
机译:在这项工作中,我们报告了用脉冲=光纤激光器的波长λ= 1062 nm的扫描束辐照对局部破坏单晶硅的过程的观察结果,并伴有烧蚀微粒的氧化。结果表明,根据照射的功率密度,观察到较大的微粒散射尺寸。从一定的平均功率密度观察到开始从照射区域的表面发射的氧化颗粒。通过改变激光束的参数,例如扫描速度,脉冲重复频率,激光点的重叠,可以实现在微粒烧蚀过程中几乎全部氧化的辐射剂量。

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