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Properties of InAs quantum dots in nanoimprint lithography patterned GaAs pits

机译：纳米压印光刻图案化的GaAs凹坑中InAs量子点的性质

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We report on the structural and optical properties of InAs quantum dots fabricated into nanoimprint lithography patterned GaAs pits. The size-dependent properties of single site-controlled quantum dots and their integration into optical microcavities are presented.

机译：我们报告的InAs量子点的结构和光学性能制成纳米压印光刻图案化的GaAs凹坑。介绍了单个位置控制的量子点的尺寸相关性质及其集成到光学微腔中。

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《Conference on Lasers and Electro-Optics 》|2013年|1-2|共2页
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Tommila J.; Schramm A.; Hakkarainen T.V.; Dumitrescu M.;
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1. Size-dependent properties of single InAs quantum dots grown in nanoimprint lithography patterned GaAs pits [J] . Tommila J., Schramm A., Hakkarainen T.V., Nanotechnology . 2013 ,第23期

机译：在纳米压印光刻图案化的GaAs凹坑中生长的单个InAs量子点的尺寸依赖性
2. Structural characterization of InAs quantum dot chains grown by molecular beam epitaxy on nanoimprint lithography patterned GaAs(100) [J] . Hakkarainen T.V., Tommila J., Schramm A., Nanotechnology . 2011 ,第29期

机译：纳米压印光刻图案化GaAs的分子束外延生长InAs量子点链的结构表征（100）
3. Selective growth of GaAs nanostructures and subsequent guided self-assembly of InAs quantum dots on nanoimprint lithography patterned SiO_2/GaAs substrates [J] . A. Tukiainen, J. Tommila, A. Aho, Journal of Crystal Growth . 2011 ,第1期

机译：GaAs纳米结构的选择性生长和随后的InAs量子点在纳米压印光刻图案化的SiO_2 / GaAs衬底上的引导自组装
4. Properties of InAs Quantum Dots in Nanoimprint Lithography Patterned GaAs Pits [C] . J. Tommila, A. Schramm, T. V. Hakkarainen, Conference on Lasers and Electro-Optics . 2013

机译：纳米压印光刻中的INAS量子点的性质图案GaAs Pits
5. Exploring Single Hole States in InAs/GaAs Quantum Dots and Quantum Dot Molecules under 2-D Electric Fields [D] . Ma, Xiangyu. 2018

机译：在2-D电场下探索InAs / GaAs量子点和量子点分子中的单孔状态
6. Comparative Study of Photoelectric Properties of Metamorphic InAs/InGaAs and InAs/GaAs Quantum Dot Structures [O] . Sergii Golovynskyi, Luca Seravalli, Oleksandr Datsenko, 2017

机译：变质InAs / InGaAs和InAs / GaAs量子点结构的光电性能比较研究
7. Molecular beam epitaxy growth of site-controlled InAs/GaAs quantum dots defined by soft photocurable nanoimprint lithography [O] . Chien-Chia Cheng 2012

机译：通过软光固化纳米压印光刻技术定义的位控InAs / GaAs量子点的分子束外延生长

Properties of InAs quantum dots in nanoimprint lithography patterned GaAs pits

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