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Measurements of conductivity of thin gold films at microwave frequencies employing resonant techniques

机译:微波频率采用共振技术的微波频率导电性的测量

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Quasi TE011 mode cavity and split post dielectric resonator have been used to measure resistivity of very thin gold films deposited on single crystal quartz substrates. It has been found that a sharp transition of electrical properties takes place for films of thickness between from 4.5 nm and 8 nm. For the films thicker than 8 nm the resistivity was comparable to that of bulk materials, and its dependence on film thickness could be described by known theoretical models, while for films thinner than 4.5 nm the resistivity was few orders of magnitude larger. Presented techniques allow measurements of resistivity of thin films in the eight decades range.
机译:准TE011模式腔体和分流后介电谐振器已被用于测量沉积在单晶石英底物上的非常薄的金膜的电阻率。已经发现,从4.5nm和8nm之间的厚度薄膜发生急剧的电性能过渡。对于厚度小于8nm的薄膜,电阻率与散装材料的电阻率相当,其对膜厚度的依赖可以通过已知的理论模型描述,而对于薄膜薄于4.5nm,电阻率较大的序列率较大。提出的技术允许在八十年范围内测量薄膜的电阻率。

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