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Advancing Static Performance and Ruggedness of 600 V SiC MOSFETs: Experimental Analysis and Simulation Study

机译:推进600 V SIC MOSFET的静态性能和坚固性:实验分析和仿真研究

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600 V MOSFETs were fabricated on 6-inch 4H-SiC substrates. Channel lengths and JFET widths were varied to study their impact on the on-state performances and blocking behaviors. Based on physical cross-sectional SEM analyses of fabricated 600 V MOSFETs, new structures were proposed to further improve the static and short circuit performances. Both static and non-isothermal, mixed-mode simulations were conducted to support the novelty of the proposed structures.
机译:600 V MOSFET在6英寸4H-SIC基板上制造。 沟道长度和JFET宽度有所多地研究它们对州对州的性能和阻塞行为的影响。 基于制造的600 V MOSFET的物理横截面SEM分析,提出了新的结构,进一步改善了静态和短路性能。 进行静态和非等温,混合模式模拟,以支持所提出的结构的新颖性。

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