Effect of Ar/O2 Ratio and Substrate Temperature on the Hydrophilicity of SiO2Thin Films Prepared by RF Reactive Magnetron Sputtering

摘要

SiO2 thin films were prepared on stainless steel substrate by RF reactive magnetron sputtering. Their microscopic surface morphology was characterized by atomic force microscope (AFM) and static contact Angle (SCA) was applied to evaluate hydrophilicity of films. It was found that SiO2 thin films showed super hydrophilicity which could last long at Ar/O2 ratio of 6:4; under such condition, substrate temperature also affects hydrophilicity of films, the best of which can be obtained at 90 °C.