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Monolithic Integration of P(VDF-TrFE) Thin Film on CMOS for Wide-band Ultrasonic Transducer Arrays

机译:用于宽带超声换能器阵列CMOS上的P(VDF-TRFE)薄膜的单片集成

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We developed a novel ultrasonic transducer with a P(VDF-TrFE) thin film monolithically integrated on a CMOS LSI. Its higher sensitivity and wider bandwidth in the 20 MHz range compared to a conventional PZT transducer is demonstrated. The P(VDF-TrFE) is an attractive piezoelectric sensor material with an excellent piezoelectric constant and low acoustic impedance matched to human tissue. However, it is difficult to miniaturize the device like a 2D array, and due to its low dielectric constant, the transducer is susceptible to parasitic capacitance of the connection circuity. This problem is solved by the monolithic formation of P(VDF-TrFE) transducers on CMOS LSI. In this study, such an ultrasonic array (16 elements × 4 channels) with a single-element area (190 × 190 μm~2) was fabricated, and the receiving acoustic characteristics were evaluated.
机译:我们开发了一种具有P(VDF-TRFE)薄膜的新型超声换能器,其单片在CMOS LSI上。与传统的PZT换能器相比,它在20MHz范围内的较高灵敏度和更宽的带宽。 P(VDF-TRFE)是一种吸引力的压电传感器材料,具有优异的压电常数和与人组织匹配的低声阻抗。然而,难以像2D阵列一样小型化,并且由于其低介电常数,换能器易于连接函数的寄生电容。该问题通过CMOS LSI上的P(VDF-TRFE)换能器的单片形成来解决。在该研究中,制造具有单元素区域(190×190μm〜2)的这种超声阵列(16个元件×4通道),并评估接收声学特性。

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