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Sputter deposition technology for Al(1?x)ScxN films with high Sc concentration

机译:具有高SC浓度的Al(1?X)SCXN膜的溅射沉积技术

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Aluminium scandium nitride (Al1?xScxN) with its strongly enhanced piezoelectric response is the upcoming piezoelectric material of choice in next generation RF filters, sensors, actuators and energy harvesting devices. This paper will concentrate on the deposition technology for Al1?xScxN films with high Sc content. Films with Sc concentrations close to 43 at% have been grown on 200-mm substrates using a cluster type sputter deposition tool. The piezoelectric response will be discussed and correlated with the deposition parameters and film structural properties. The steps required to deliver a high-volume production solution for high Sc concentration will be described.
机译:具有强大增强的压电响应的铝钪(Al1 xScxn)是在下一代RF滤波器,传感器,致动器和能量收集装置中选择的即将到来的压电材料。本文将专注于具有高SC含量的AL1 XSCXN薄膜的沉积技术。使用簇型溅射沉积工具,在200mm基板上生长了近43at%的SC浓度的薄膜。将讨论压电响应和与沉积参数和膜结构性能相关。将描述为高SC浓度提供高批量生产溶液所需的步骤。

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