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Lithography technology and trends for advanced packaging

机译:高级包装的光刻技术和趋势

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Lithography requirements for Advanced Packaging are very different compared to mainstream semiconductor industries' needs. Even if the market entry barrier is much lower in the "More than Moore" market, customer adoptions needs are higher in the packaging area with respect to resolution, overlay, sidewall angle, and depth of focus (DOF), wafer handling for wafer bow and backside alignment. Key technical trends, requirements and challenges regarding the lithography technologies will be addressed in this paper. In addition, more insights on the current and emerging lithography methods for Advanced Packaging will be included, as well as market forecast, competitive landscape of the major equipment and materials suppliers addressing this field.
机译:与主流半导体行业的需求相比,先进包装的光刻要求非常不同。即使在“超过摩尔”市场的市场进入屏障低得多,客户采用在包装区域的情况下,用于分辨率,覆盖,侧壁角度和焦点(DOF)深度(DOF),晶圆弓的晶圆处理也更高和背面对齐。本文将解决关于光刻技术的关键技术趋势,要求和挑战。此外,还将包括更多关于先进包装的电流和新兴光刻方法的更多洞察力,以及推荐该领域的主要设备和材料供应商的市场预测。

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