Imaging optics setup and optimization on scanner for SMO generationprocess

摘要

Source & Mask Optimization1 (SMO) is a promising candidate to realize further reduction of k1 factor to achieve 22nmfeature lithography and beyond. To make the SMO solutions feasible all imaging-related parameters should be closer tothe designed parameters used in SMO process.In this paper, we discuss how we realize this in the imaging system setup on the scanner. The setup process includesfreeform pupilgram generation, pupilgram adjustment and thermal aberration control. For each step the importantfactors are speed and accuracy.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.