首页> 外文会议>Conference on metrology, inspection, and process control for microlithography XXVI >Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM
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Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM

机译:使用STEM和截面SEM对线宽测量和线边缘检测进行亚纳米级校准

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The novel method of sub-nanometer accuracy (uncertainty) for the line width measurement and line edge detection usingSTEM (Scanning Transmission Electron Microscope) images is proposed to calibrate CD-SEM line width measurementand standardization of line
机译:提出了一种新的亚纳米精度(不确定度)测量线宽和使用STEM(扫描透射电子显微镜)图像进行线边缘检测的方法,以校准CD-SEM线宽测量和线标准化

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