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Research on the Properties of NiZnO Thin Films

机译:NiZnO薄膜的性能研究

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NiZnO thin films had been fabricated on cplane sapphire substrates using photo-assisted metal organic chemical vapour deposition system. The crystal quality of the films had been improved greatly comparing to the results in earlier reports. The crystal structure analysis indicated the NiZnO kept the basic wurtzite structure until the content of Ni attained 0.18. The crystal and electrical properties of the films showed the content of Ni had an important effect on the properties of NiZnO films.
机译:使用光辅助金属有机化学气相沉积系统在cplane蓝宝石衬底上制备了NiZnO薄膜。与以前的报道相比,薄膜的晶体质量有了很大的提高。晶体结构分析表明,NiZnO保持基本的纤锌矿结构,直到Ni的含量达到0.18。薄膜的晶体和电学性能表明,Ni的含量对NiZnO薄膜的性能有重要影响。

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