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Preparation and Characteristics of Multilayer Magnesium Diboride Superconducting Films via CVD Method

机译:CVD法制备多层二硼化镁超导薄膜及其特性

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In this work we present the technology of preparing multilayer MgB2 superconducting films via CVD method. The first layer of the MgE$2 superconducting film was obtained by two-step method: growthing the precursor boron film on a polycrystalline AI2O3 substrate first, then post annealing the film in magnesium ambient, thus we got the first layer of MgB2 film. After that a pure boron film was deposited on the Mgfb film,acting as the medium insulating layer, finally the second layer of the MgB2 superconducting film was formed by in-situ growth, evaporated magnesium atoms and boron atoms that decomposed from diborane met near the substrate and generated the second layer of the MgB2 superconducting film. The square resistance of the boron medium insulation layer is higher than 20 MD. The transition temperature of the both superconducting films was above 38 K, and the temperature for zero resistance is above 37 K. We found that different thickness of the B layer made different I-V curve between two superconducting films, which is very important for the use of Josephson junction. More meaningful results can be expected as the experiment goes on.
机译:在这项工作中,我们介绍了通过CVD方法制备多层MgB2超导膜的技术。 MgE $ 2超导膜的第一层是通过两步法获得的:首先在多晶AI2O3衬底上生长前驱体硼膜,然后在镁环境中对膜进行后退火,从而得到第一层MgB2膜。之后在纯Mgfb膜上沉积纯硼膜,作为介质绝缘层,最后通过原位生长形成MgB2超导膜的第二层,蒸发的镁原子和由乙硼烷分解的硼原子在反应室附近相遇。衬底并产生第二层的MgB2超导膜。硼介质绝缘层的平方电阻高于20 MD。两种超导膜的转变温度均高于38 K,零电阻温度高于37K。我们发现,不同厚度的B层在两种超导膜之间形成不同的IV曲线,这对于使用超导膜非常重要。约瑟夫森交界处。随着实验的进行,可以预期会有更有意义的结果。

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