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A novel approach to estimate the impact of analog circuit performance based on the small signal model under process variations

机译:一种基于小信号模型在工艺变化下估算模拟电路性能影响的新颖方法

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Continuous scaling in CMOS fabrication process makes integrated circuits more vulnerable to process variations. The impact on circuit performance caused by process variations in CMOS circuit is usually analyzed by Monte Carlo method with a large number of simulation runs. This paper proposes a novel approach to estimate the impact of analog circuit performance based on the small signal model under process variations. The accuracy of the small signal model has been verified with CMOS circuit. The proposed approach has been demonstrated by a CMOS two-stage operational transconductance amplifier (OTA). To achieve an accurate estimate, the modified small signal model which consider more parasitic capacitors in CMOS transistor, has been applied in the proposed approach. By applying the proposed approach based on optimization method, the upper and lower bounds of magnitude and phase, can be evaluated accurately in much less computation time compared to Monte Carlo simulations. All experimental results are carried out using a standard 0.35-µm CMOS process technology.
机译:CMOS制造工艺中的连续缩放使集成电路更容易受到工艺变化的影响。通常通过蒙特卡罗方法并通过大量的模拟运行来分析由CMOS电路中的工艺变化引起的对电路性能的影响。本文提出了一种基于小信号模型在工艺变化下估算模拟电路性能影响的新颖方法。小信号模型的准确性已通过CMOS电路进行了验证。 CMOS两级运算跨导放大器(OTA)已证明了所提出的方法。为了获得准确的估计,在建议的方法中应用了修改后的小信号模型,该模型考虑了CMOS晶体管中更多的寄生电容器。通过应用基于优化方法的建议方法,与蒙特卡洛模拟相比,可以在更短的计算时间内准确评估幅度和相位的上下边界。所有实验结果均使用标准的0.35 µm CMOS工艺技术进行。

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