Electrical monitoring of gate and active area mask misalignment error

摘要

A model-free, gate-diffusion (PC-RX) misalignment monitor circuit is implemented in 32nm CMOS for fabrication tool and layout ground rule characterization. It requires only DC current measurements compared to existing optical methods that require special microscopy equipment. An on-chip circuit is also designed to convert misalignment to digital data to enable post-Si repair.