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COMPARISON OF DIRECT CURRENT AND CATHODIC CAGE PLASMA NITRIDING TECHNIQUES1

机译:直接电流和阴极笼等离子体渗氮技术的比较1

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Over the last decade, various plasma nitriding techniques exploring shielding of parts were used in order to eliminate problems in the conventional nitriding technique as edge effects and non-uniformity heating. The cathodic cage plasma nitriding (CCPN) is a technique that uses a same shielding as active screen but with better efficiency and control of process because multi hollow cathodes formation. In this work, the CCPN technique was compared with conventional technique called direct current plasma nitriding (DCPN) during nitriding of both AISI 316 and AISI 1020 steels. Rods with 8.0 mm in diameter were cut to various heights: 1, 3, 5, 8 and 10 mm and nitrided at temperature of 773K, 723K and 673 K using both (DCPN) and (CCPN). Influence of parameters as pressure, position and time of treatment were also evaluated. Unlike of the DCPN, the samples nitrided by CCPN did not have restriction rings in the layer and the hardness on surface is independent of the height of the samples. Further it was observed that the CCPN has a nitriding rate higher than the DCPN when the pressure for the occurrence of the effect of hollow cathode is properly used. These results shows a better efficiency of the CCPN when compared with the conventional technique, evidencing also that the application of such a new technique eliminates problem as thermal gradient and edge effect.
机译:在过去的十年中,为了消除传统氮化技术中的边缘效应和不均匀加热等问题,人们采用了各种探索零件屏蔽的等离子渗氮技术。阴极笼等离子体氮化(CCPN)是一种使用与有源屏相同的屏蔽层的技术,但是由于形成了多个空心阴极,因此具有更高的效率和工艺控制能力。在这项工作中,在AISI 316和AISI 1020钢的氮化过程中,将CCPN技术与称为直流等离子体氮化(DCPN)的常规技术进行了比较。将直径为8.0 mm的棒切成各种高度:1、3、5、8和10 mm,并使用(DCPN)和(CCPN)在773K,723K和673 K的温度下进行氮化。还评估了压力,治疗位置和治疗时间等参数的影响。与DCPN不同,被CCPN氮化的样品在层中没有限制环,并且表面硬度与样品的高度无关。进一步观察到,当适当使用发生空心阴极效应的压力时,CCPN的氮化率高于DCPN。这些结果表明,与传统技术相比,CCPN的效率更高,这也证明了这种新技术的应用消除了热梯度和边缘效应等问题。

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