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Molecular dynamics simulations of oblique phonon scattering at semiconductor interfaces

机译:半导体界面倾斜声子散射的分子动力学模拟

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Equilibrium molecular dynamics simulations are used to determine the transmission probability of oblique phonons scattering on flat and rough surfaces. The transmission is determined from the total energy change of the materials comprising the interface. We consider semiconductor films of silicon (Si) and germanium (Ge) as interfacing materials. A symmetric sawtooth (triangular) structure of varying height (similar to that analyzed in Appl. Phys. Lett., 93(8), 2008) is used to introduce surface roughness. We have found that the transmission is a strong function of the phonon incident angle, frequency, mass ratio of the comprising semiconductors and roughness height. An interesting behavior in the transmission probability is observed with the introduction of controlled surface roughness. Low frequency phonons can have transmission values higher than those predicted in the acoustic limit. Conversely, they decrease significantly for high frequency phonons. Maximum and minimum values in the transmission probability are found for surface roughness of 4.34 nm height.
机译:平衡分子动力学模拟用于确定斜声子在平坦和粗糙表面上的散射传播概率。传输是根据构成界面的材料的总能量变化来确定的。我们将硅(Si)和锗(Ge)的半导体膜视为接口材料。使用高度变化的对称锯齿(三角形)结构(类似于Appl。Phys。Lett。,93(8),2008中分析的结构)来引入表面粗糙度。我们已经发现,透射率是声子入射角,频率,组成半导体的质量比和粗糙度高度的强函数。通过引入受控的表面粗糙度,可以观察到传输概率中的一个有趣行为。低频声子的透射值可能会高于声学极限中预测的值。相反,对于高频声子,它们显着降低。对于4.34 nm高的表面粗糙度,可以找到透射概率的最大值和最小值。

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