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Molecular dynamics simulations of oblique phonon scattering at semiconductor interfaces

机译:半导体界面倾斜子散射的分子动力学模拟

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Equilibrium molecular dynamics simulations are used to determine the transmission probability of oblique phonons scattering on flat and rough surfaces. The transmission is determined from the total energy change of the materials comprising the interface. We consider semiconductor films of silicon (Si) and germanium (Ge) as interfacing materials. A symmetric sawtooth (triangular) structure of varying height (similar to that analyzed in Appl. Phys. Lett., 93(8), 2008) is used to introduce surface roughness. We have found that the transmission is a strong function of the phonon incident angle, frequency, mass ratio of the comprising semiconductors and roughness height. An interesting behavior in the transmission probability is observed with the introduction of controlled surface roughness. Low frequency phonons can have transmission values higher than those predicted in the acoustic limit. Conversely, they decrease significantly for high frequency phonons. Maximum and minimum values in the transmission probability are found for surface roughness of 4.34 nm height.
机译:平衡分子动力学模拟用于确定平坦和粗糙表面上的倾斜子散射的传输概率。从包括界面的材料的总能量变化确定传输。我们将硅(Si)和锗(Ge)的半导体薄膜视为接口材料。一个不同高度的对称锯齿(三角形)结构(类似于Appl中的分析。物理。Lett。,93(8),2008)用于引入表面粗糙度。我们已经发现,传动是声子入射角的强功能,频率,质量比包括半导体和粗糙度高度。通过引入受控表面粗糙度观察到传输概率中的有趣行为。低频声子可以具有高于声学极限预测的传输值。相反,它们对高频声子显着减少。发现传输概率中的最大值和最小值对于4.34nm高度的表面粗糙度。

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