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A novel and acurate delay and slew metrics for ramp inputs for on-chip VLSI RC interconnect using Weibull distribution function

机译:使用Weibull分布函数的片上VLSI RC互连的斜坡输入的新颖且精确的延迟和转换指标

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In deep sub-micrometer (DSM) regime the on-chip interconnects delay is significantly more dominating than the gate delay. Several approaches have been proposed to capture the interconnect delay accurately and efficiently. Moments of the impulse response are widely used for interconnect delay analysis, from the explicit Elmore delay (the first moment of the impulse response) expression, to moment matching methods which creates reduced order trans-impedance and transfer function approximations. However, the Elmore delay is fast becoming ineffective for deep submicron technologies, and reduced order transfer function delays are impractical for use as early-phase design metrics or as design optimization cost functions In this paper we have proposed an accurate and efficient model to compute the delay and slew metric of on-chip interconnect of high speed CMOS VLSI designs. We used the PERI (Probability distribution function Extension for Ramp Inputs) technique to the Weibull distribution that extends delay and slew metrics for step inputs to the more general and realistic non-step inputs. The accuracy of our model is justified with the results compared with that of SPICE simulations.
机译:在深亚微米(DSM)方案中,片上互连延迟比栅极延迟更重要。已经提出了几种方法来准确有效地捕获互连延迟。脉冲响应的时刻被广泛用于互连延迟分析,从显式的Elmore延迟(脉冲响应的第一时刻)表达式,到产生匹配的递减阻抗和传递函数近似的时刻匹配方法。然而,对于深亚微米技术,Elmore延迟正迅速变得无效,并且降低阶次传递函数延迟对于用作早期设计指标或作为设计优化成本函数是不切实际的。在本文中,我们提出了一种准确而有效的模型来计算高速CMOS VLSI设计的片上互连的延迟和转换指标。我们对WEIBULL分布使用了PERI(概率分布函数对斜坡输入的扩展)技术,该方法将步长输入的延迟和转换指标扩展到更通用,更实际的非步长输入。通过与SPICE仿真的结果进行比较,可以证明我们模型的准确性。

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