Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

摘要

This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.