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A simple and effective ESD protection structure for high-voltage-tolerant I/O pad

机译:一种简单有效的ESD保护结构,用于耐高压I / O焊盘

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A simple and effective ESD protection structure is proposed for the high-voltage-tolerant I/O pad. It can tolerate a voltage higher than the power supply voltage without the leakage current caused by PMOS in original GGNMOS/GDPMOS protection structure. And it can provide a direct current path under PD/ND mode ESD stress, which is missing in general ESD design for the high-voltage-tolerant I/O pad. It can sustain 2.7A TLP stress according to our simulation result. This protection structure can also be used for high voltage and high power open drain driver and the negative-voltage-tolerant I/O pad.
机译:提出了一种用于耐高压I / O焊盘的简单有效的ESD保护结构。它可以承受高于电源电压的电压,而不会在原始GGNMOS / GDPMOS保护结构中造成PMOS引起的泄漏电流。而且它可以在PD / ND模式ESD应力下提供直流路径,这是耐高压I / O焊盘的常规ESD设计中所没有的。根据我们的仿真结果,它可以承受2.7A TLP应力。该保护结构还可用于高压大功率漏极开路驱动器和耐负压I / O焊盘。

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