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High-voltage tangent delta determination for dielectric barrier discharge intended materials

机译:用于介质阻挡放电的材料的高压正切增量确定

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The measurement of dissipative factor tan δ for various commercial types of Al_2O_3 ceramics and Al_2O_3 ceramics doped with TiO_2 is presented. The measurements were done at low (IV) and high voltage (5 kV) experiment setup. The clear differences were observed as the level of dissipative factor was up to 7 times higher for materials tested at high voltage conditions. This result is of importance for designing the large scale DBD plasma reactors, where the economy of the process needs to be pursued. The lowest values of dissipative factor for both low and high voltage measurements were obtained for the low-sintering temperature, Taimicron powder based ceramics prepared in our laboratory. The value of dissipative factor remained low even after adding 5 wt. % of TiO_2 admixture.
机译:给出了各种商业类型的Al_2O_3陶瓷和掺杂TiO_2的Al_2O_3陶瓷的耗散因子tanδ的测量结果。测量是在低(IV)和高电压(5 kV)实验设置下进行的。观察到明显的差异,因为在高压条件下测试的材料的耗散因子水平高出7倍。该结果对于设计大型DBD等离子体反应器非常重要,在该反应器中,必须追求工艺的经济性。在我们实验室中制备的低烧结温度,基于泰微米粉的陶瓷中,获得了低电压和高电压测量中的最低耗散因子值。即使添加5wt。%,耗散因子的值仍保持较低。 TiO_2混合物的%。

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