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Semipolar nitrides grown on Si(001) offcut substrates with 3C-SiC buffer layers

机译:在具有3C-SiC缓冲层的Si(001)边界衬底上生长的半极性氮化物

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The growth process of semipolar GaN(10-12) on Si(001) offcut substrates with 3C-SiC buffer layers has been investigated. From XRD analysis, the difference in the crystal orientation between GaN(10-12) and 3C-SiC(001) has been found to be around 8° toward the [110] direction of the 3C-SiC templates. From TEM observations, a cubic-phase A1N seed layer is found to grow on 3C-SiC(001) templates, and the swift transition from the cubic phase to a hexagonal phase leads to the stable growth of hexagonal nitrides. Using 8°-offcut Si substrates, it is possible to obtain a mirror-like surface of GaN(10-12) using an approximately 10-nm-thick A1N seed layer, which swiftly transitions from cubic AlN to hexagonal GaN.
机译:研究了具有3C-SiC缓冲层的Si(001)衬底上半极性GaN(10-12)的生长过程。通过XRD分析,发现GaN(10-12)和3C-SiC(001)之间的晶体取向差异朝3C-SiC模板的[110]方向大约为8°。从TEM观察,发现立方相AlN籽晶层在3C-SiC(001)模板上生长,并且从立方相到六方相的快速转变导致六方氮化物的稳定生长。使用8°斜角Si衬底,可以使用厚度大约为10 nm的AlN种子层获得GaN(10-12)的镜面表面,该种子层从立方AlN迅速转变为六角形GaN。

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