VANADIUM THIN FILMS PREPARED BY CHEMICAL VAPOR DEPOSITION FOR SEPARATING HYDROGENE

摘要

Vanadium thin films were prepared on sintered porous metallic substrates by chemical vapor deposition (CVD) to approach the thermal expansion coefficient of films and substrates. Organometallic compound was used as a vanadium source to avoid chlorine, which is harmful to metallic materials. The films were obtained under controlled conditions, which were processing temperatures, pressures of CVD chamber and flow rates of carrier gas (Ar) for source material. The morphologies of films were observed by scanning electron microscopy (SEM), and the elements in the films were investigated by energy dispersive X-ray spectroscopy (EDX).